Hui Zhao, Jingfeng Wang, Mukun He, Shuai Li, Hua Guo, Dongxiao Kan, Hua Qiu, Lixin Chen* and Junwei Gu*. Electromagnetic Interference Shielding Films: Structure Design and Prospects. Small Methods, 2024, DOI: 10.1002/smtd.202401324. 2023IF=10.7.
https://onlinelibrary.wiley.com/doi/10.1002/smtd.202401324
Abstract
The popularity of portable and wearable flexible electronic devices, coupled with the rapid advancements in military field, requires electromagnetic interference (EMI) shielding materials with lightweight, thin, and flexible characteristics, which are incomparable for traditional EMI shielding materials. The film materials can fulfill the above requirements, making them among the most promising EMI shielding materials for next-generation electronic devices. Meticulously controlling structure of composite film materials while optimizing the electromagnetic parameters of the constructed components can effectively dissipate and transform electromagnetic wave energy. Herein, the review systematically outlines high-performance EMI shielding composite films through structural design strategies, including homogeneous structure, layered structure, and porous structure. The attenuation mechanism of EMI shielding materials and the evaluation (Schelkunoff theory and calculation theory) of EMI shielding performance are introduced in detail. Moreover, the effect of structure attributes and electromagnetic properties of composite films on the EMI shielding performance is analyzed, while summarizing design criteria and elucidating the relevant EMI shielding mechanism. Finally, the future challenges and potential application prospects of EMI shielding composite films are prospected. This review provides crucial guidance for the construction of advanced EMI shielding films tailored for highly customized and personalized electronic devices in the future.
便携式、可穿戴柔性电子设备的普及以及军事领域的快速发展，对电磁屏蔽材料提出了轻质、薄型、柔性等特性要求，这是传统电磁屏蔽材料无法比拟的。而薄膜材料能够兼顾上述要求，已经成为下一代电子设备最有前途的电磁屏蔽材料之一。在精细调控薄膜材料结构的同时，优化组构的电磁参数，可有效地耗散和转化电磁波能量。因此，从结构设计出发，本综述系统地概述了高性能电磁屏蔽复合薄膜的研究进展，包括均匀结构、层状结构、多孔结构等。详细介绍了电磁屏蔽材料的衰减机理和电磁屏蔽性能的评价方法（Schelkunoff理论和计算理论），重点分析了复合薄膜的结构特性和电磁参数对电磁屏蔽性能的影响规律，同时，总结了电磁屏蔽复合薄膜的设计准则，并阐明了相关的电磁屏蔽机理。最后，展望了电磁屏蔽复合薄膜面临的挑战和潜在的应用前景，为未来高度定制化、个性化电子设备所需的先进电磁屏蔽薄膜的构建提供了重要的指导。
第一作者：赵辉
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